Cheng-Che(Jerry) Hsu Professor

徐振哲 教授


email: chsu



Lab Info

Plasma Engineering Laboratory

302, 304


Education Background

B.S. Ch.E. National Taiwan University, 1996
M.S. Ch.E. National Taiwan University, 1998
PhD. Ch.E. University of California at Berkeley, 2006

Research Topic

Plasma Science and Application

Plasma Science and Application

Research work in my group focuses on fundamental studies and the application of low temperature plasmas. These plasmas are widely used for etching, thin film deposition, surface modification, and pollutant abatement in a large variety of industries such as semiconductor manufacturing, optoelectronics, and liquid crystal display manufacturing industries. Currently, my research work focuses on the following areas:

  1. plasma processing techniques
  2. fabrication and characterization of nano-scale and thin film materials  
  3. numerical simulation of plasma processes  

In the fundamental aspect, we are particularly interested in studying plasma chemistry, plasma physics as well as plasma-surface interactions through experimental and modeling approaches. On the applicational side, we utilize plasmas for material processing, such as fabrication of nanowires and nanoparticles and material surface modification, such as surface functionalization and surface treatment. Further, we look into how the plasma characteristics influence the process and identify the factors that dominate the process. Through the integrated effort of fundamental studies and applicational researches, we are solving technically important fundamental problems associated with plasma processes.

Recent Research Topic

1.大氣電漿的檢測與數值模擬及其在奈米粉體製程上的應用  (Diagnostic Study and Numerical Simulation of Atmospheric Pressure Plasmas and the Applications to Nanoparticle Fabrication) 國科會NT 1,066,000, 08/01/2009-07/31/2010
2.常壓中空陰極電極特性模擬研究(Simulation of Atmospheric Pressure Hollow Cathode Plasmas) 行政院原委會核研所 NT 500,000, 04/01/2009~12/31/2009


The Representative Publication Recent 5-years Publication

1. C. Y. Sie, H. W. Chang, and C. C. Hsu, “Tungsten Electrode Erosion by Microplasmas in Saline Solution”, J. Electrochem. Soc. 158, E37 (2011). (SCI,EI)

2. H. W. Chang, and C. C. Hsu, “Diagnostic studies of AC-driven plasmas in saline solutions: the effect of the frequency on the plasma behavior”, Plasma Sources Sci. Technol., 20, 045001 (2011). (SCI,EI)

3. A. S. Hsieh, H. W. Chang, and C. C. Hsu, “The Bubble to Jetting Transition Mechanism of Plasmas in NaNO3 Solutions Sustained by Pulsed Power”, J. Phys. D – Appl Phys. 45, 415202 (2012)(SCI)

4. S. K. Fan, Y T Shen, L. P. Tsai, C. C. Hsu, F. H. Ko, and Y. T. Cheng, “Atmospheric-Pressuer Microplasma in Dielectrophoresis-Driven Bubbles for Optical Emission Spectrometry”, Lab on a Chip, 12, 3694 (2012) (SCI)

5. H. W. Chang and C. C. Hsu, “Plasmas in saline solutions sustained using rectified AC voltages: polarity and frequency effects on the discharge behavior”, J. Phys. D – Appl Phys. 45, 455203 (2012) (SCI)

6. C. C. Hsu, J. H. Tsai, Y. J. Yang, Y. C. Liao, and Y. W. Lu, A Foldable Microplasma-Generation Device on a Paper Substrate, J. MEMS. 21, 1013 (2012) (SCI) (合著)

7. P. Y. Wang, T. H. Wu, P. G. Chao, W. H. Kuo, M. J. Wang, C. C. Hsu, and W. B. Tsai, “Modulation of Cell Attachment and Collagen Production of Anterior Cruciate Ligament Cells Via Submicron Grooves/Ridges Structures With Different Cell Affinity”, Biotechnology and Bioengineering, 110, 327 (2013) (SCI). (合著)

8. S. T. Lien, H. C. Li, Y. J. Yang, C. C. Hsu, I. C. Cheng, and J. Z. Chen, “Atmospheric pressure plasma jet annealed ZnO films for MgZnO/ZnO heterojunctions”, J. Phys. D – Appl Phys., 46, 075202 (2013). (SCI)

9. Y. J. Yang and C. C. Hsu, “A Flexible Paper-based Microdischarge Array Device for Maskless Patterning on Non-flat Surface”, J. MEMS., 22, 256 (2013) (SCI)

10. H. M. Chang, Y. J. Yang, H. C. Li, C. C. Hsu, I. C. Chen, and J. Z. Chen, “Preparation of nanoporous TiO2 films for DSSC application by a rapid atmospheric pressure plasma jet sintering process”, J. Power Sources, 234, 16 (2013). (SCI)

11. A. S. Hsieh, K. C.-W Wu, C. C. Hsu, Kinetic Study of Acid Orange 7 Degradation Using Plasmas in NaNO3 Solution Sustained by Pulsed Power, Journal of the Taiwan Institute of Chemical Engineers, in press  (合著)(SCI,EI)

12. C. C. Hsu, N. Marchack, R.M. Martin , C. Pham , J. Hoang, and J. P. Chang, “Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition”, J. Vac. Sci. Tech. B., 31, 042201 (2013)(SCI, EI)

13. H. W. Chang and C. C. Hsu, “Plasmas in Saline Solution Sustained Using Bipolar Pulsed Power Source – Tailoring the Discharge Behavior Using the Negative Pulses”, Plasma Chem. Plasma Process, 33, 581 (2013).(SCI, EI)

14. H. Y. Chen, T. J. Lin, M. Y. Tsai, C. T. Su, R. H. Yuan, C. C. Hsieh, Y. J. Yang, C. C. Hsu, H. M. Hsiao, and Y. C. Hsu, Vapor-Based Tri-Functional Coatings, Chem. Comm. 49, 4531 (2013). (合著)(SCI)

15. W. Y. Liao, H. M. Chang, Y. J. Yang, C. C. Hsu, I. C. Cheng, and J. Z. Chen, “Oxygen-Deficient Indium Tin Oxide Thin Films Annealed by Atmospheric Pressure Plasma Jets With/Without Air-Quenching”, Appl. Surf. Sci. Accepted. (SCI)(SCI, EI)

16. H. M. Chang, C. M. Hsu, P. K. Kao, Y. J. Yang, C. C. Hsu, I. C. Cheng, and J. Z. Chen, “Dye-sensitized solar cells with nanoporous TiO2 photoanodes sintered by N2 and air atmospheric pressure plasma jets with/without air-quenching”, Journal of Power Sources, 251, 215 (2014) (SCI, EI)

17. S. M. Chang, R. F. Erwin, Y. J. yang, H. C. Li, R. C. Lee, N. L. Wu, and C. C. Hsu, One-Step Fast Synthesis of Li4Ti5O12 Particles Using an Atmospheric Pressure Plasma Jet Journal of the American Ceramic Society, in press  (合著)(SCI, EI)

18. S. T Lien, J. Z. Chen, Y. J. Yang, C. C. Hsu, and I. C. Cheng, “Sol-gel derived amorphous/nanocrystalline MgZnO thin films annealed by atmospheric pressure plasma jets” Ceramics International, accepted.  (SCI, EI)

19. J. H. Tsai, C. M. Hsu, and C. C. Hsu, “Numerical Simulation of Downstream Kinetics of an Atmospheric Pressure Nitrogen Plasma Jet using Laminar, Modified Laminar, and Turbulent Models”, Plasma Chem. Plasma Process, accepted.(SCI, EI)

20. P. K. Kao and C. C. Hsu, “One Step Rapid Fabrication of Paper-based Microfluidic Devices using Fluorocarbon Plasma Polymerization”, Microfluidics and Nanofluidics, accepted. (SCI, EI)