教授介紹


 

徐振哲 教授

Cheng-Che(Jerry) Hsu

電話(02)3366-3034
傳真(02)23623040

電子郵件 chsu

辦公室:215A

 

研究室資料

電漿工程研究室

302, 304

(02)3366-9751

學經歷

國立台灣大學  化工學士,1996
國立台灣大學  化工碩士,1998
加州大學柏克萊分校  化工博士,2006


研究主題

電漿科學與應用

本研究室的研究著眼於低溫電漿在基礎科學與應用方面的研究。低壓電漿在半導體業,光電業,LCD面板製造業等多種工業上被廣泛地應用,包含蝕刻,薄膜製備,表面改質與污染物處理等。我們目前的研究工作著重於以下三部份:


1.電漿製程技術


2.薄膜與奈米材料製備技術


3.電漿數值模擬


在基礎研究方面,我們以實驗與數值模擬之方式研究電漿化學、電漿物理以及電漿與表面之交互作用。在應用領域方面,我們以電漿從事材料製程與表面改質等工作,進而探討電漿對整個製程與材料特性的影響。藉由基礎與應用方面研究的整合,我們將探討電漿製程於工程應用上與基礎科學相關的若干課題。



最新研究

1.大氣電漿的檢測與數值模擬及其在奈米粉體製程上的應用  (Diagnostic Study and Numerical Simulation of Atmospheric Pressure Plasmas and the Applications to Nanoparticle Fabrication) 國科會NT 1,066,000, 08/01/2009-07/31/2010
 
2.常壓中空陰極電極特性模擬研究(Simulation of Atmospheric Pressure Hollow Cathode Plasmas) 行政院原委會核研所 NT 500,000, 04/01/2009~12/31/2009
 


榮譽獎項


 
代表著作 近五年著作

1. C. Y. Sie, H. W. Chang, and C. C. Hsu, “Tungsten Electrode Erosion by Microplasmas in Saline Solution”, J. Electrochem. Soc. 158, E37 (2011). (SCI,EI)

2. H. W. Chang, and C. C. Hsu, “Diagnostic studies of AC-driven plasmas in saline solutions: the effect of the frequency on the plasma behavior”, Plasma Sources Sci. Technol., 20, 045001 (2011). (SCI,EI)

3. A. S. Hsieh, H. W. Chang, and C. C. Hsu, “The Bubble to Jetting Transition Mechanism of Plasmas in NaNO3 Solutions Sustained by Pulsed Power”, J. Phys. D – Appl Phys. 45, 415202 (2012)(SCI)

4. S. K. Fan, Y T Shen, L. P. Tsai, C. C. Hsu, F. H. Ko, and Y. T. Cheng, “Atmospheric-Pressuer Microplasma in Dielectrophoresis-Driven Bubbles for Optical Emission Spectrometry”, Lab on a Chip, 12, 3694 (2012) (SCI)

5. H. W. Chang and C. C. Hsu, “Plasmas in saline solutions sustained using rectified AC voltages: polarity and frequency effects on the discharge behavior”, J. Phys. D – Appl Phys. 45, 455203 (2012) (SCI)

6. C. C. Hsu, J. H. Tsai, Y. J. Yang, Y. C. Liao, and Y. W. Lu, A Foldable Microplasma-Generation Device on a Paper Substrate, J. MEMS. 21, 1013 (2012) (SCI) (合著)

7. P. Y. Wang, T. H. Wu, P. G. Chao, W. H. Kuo, M. J. Wang, C. C. Hsu, and W. B. Tsai, “Modulation of Cell Attachment and Collagen Production of Anterior Cruciate Ligament Cells Via Submicron Grooves/Ridges Structures With Different Cell Affinity”, Biotechnology and Bioengineering, 110, 327 (2013) (SCI). (合著)

8. S. T. Lien, H. C. Li, Y. J. Yang, C. C. Hsu, I. C. Cheng, and J. Z. Chen, “Atmospheric pressure plasma jet annealed ZnO films for MgZnO/ZnO heterojunctions”, J. Phys. D – Appl Phys., 46, 075202 (2013). (SCI)

9. Y. J. Yang and C. C. Hsu, “A Flexible Paper-based Microdischarge Array Device for Maskless Patterning on Non-flat Surface”, J. MEMS., 22, 256 (2013) (SCI)

10. H. M. Chang, Y. J. Yang, H. C. Li, C. C. Hsu, I. C. Chen, and J. Z. Chen, “Preparation of nanoporous TiO2 films for DSSC application by a rapid atmospheric pressure plasma jet sintering process”, J. Power Sources, 234, 16 (2013). (SCI)

11. A. S. Hsieh, K. C.-W Wu, C. C. Hsu, Kinetic Study of Acid Orange 7 Degradation Using Plasmas in NaNO3 Solution Sustained by Pulsed Power, Journal of the Taiwan Institute of Chemical Engineers, in press  (合著)(SCI,EI)

12. C. C. Hsu, N. Marchack, R.M. Martin , C. Pham , J. Hoang, and J. P. Chang, “Feature profile evolution during shallow trench isolation etching in chlorine-based plasmas. III. The effect of oxygen addition”, J. Vac. Sci. Tech. B., 31, 042201 (2013)(SCI, EI)

13. H. W. Chang and C. C. Hsu, “Plasmas in Saline Solution Sustained Using Bipolar Pulsed Power Source – Tailoring the Discharge Behavior Using the Negative Pulses”, Plasma Chem. Plasma Process, 33, 581 (2013).(SCI, EI)

14. H. Y. Chen, T. J. Lin, M. Y. Tsai, C. T. Su, R. H. Yuan, C. C. Hsieh, Y. J. Yang, C. C. Hsu, H. M. Hsiao, and Y. C. Hsu, Vapor-Based Tri-Functional Coatings, Chem. Comm. 49, 4531 (2013). (合著)(SCI)

15. W. Y. Liao, H. M. Chang, Y. J. Yang, C. C. Hsu, I. C. Cheng, and J. Z. Chen, “Oxygen-Deficient Indium Tin Oxide Thin Films Annealed by Atmospheric Pressure Plasma Jets With/Without Air-Quenching”, Appl. Surf. Sci. Accepted. (SCI)(SCI, EI)

16. H. M. Chang, C. M. Hsu, P. K. Kao, Y. J. Yang, C. C. Hsu, I. C. Cheng, and J. Z. Chen, “Dye-sensitized solar cells with nanoporous TiO2 photoanodes sintered by N2 and air atmospheric pressure plasma jets with/without air-quenching”, Journal of Power Sources, 251, 215 (2014) (SCI, EI)

17. S. M. Chang, R. F. Erwin, Y. J. yang, H. C. Li, R. C. Lee, N. L. Wu, and C. C. Hsu, One-Step Fast Synthesis of Li4Ti5O12 Particles Using an Atmospheric Pressure Plasma Jet Journal of the American Ceramic Society, in press  (合著)(SCI, EI)

18. S. T Lien, J. Z. Chen, Y. J. Yang, C. C. Hsu, and I. C. Cheng, “Sol-gel derived amorphous/nanocrystalline MgZnO thin films annealed by atmospheric pressure plasma jets” Ceramics International, accepted.  (SCI, EI)

19. J. H. Tsai, C. M. Hsu, and C. C. Hsu, “Numerical Simulation of Downstream Kinetics of an Atmospheric Pressure Nitrogen Plasma Jet using Laminar, Modified Laminar, and Turbulent Models”, Plasma Chem. Plasma Process, accepted.(SCI, EI)

20. P. K. Kao and C. C. Hsu, “One Step Rapid Fabrication of Paper-based Microfluidic Devices using Fluorocarbon Plasma Polymerization”, Microfluidics and Nanofluidics, accepted. (SCI, EI)